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US 5,196,285 AGranted
Method for control of photoresist develop processes
AssigneeXinix, Inc.
InventorMariste A. Thomson
Life of this patent
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Abstract
A method for the control of photoresist develop processes employing multiple spray-puddle steps in which process changes other than time, such as endpoint are used to determine the length of the spray and puddle steps.
Claims13
A method of developing a layer of photoresist material, comprising the steps of:
- applying a developer solution onto the photoresist layer,
- thereafter allowing at least some of the applied developer solution to remain on the photoresist layer,
- while the developer solution remains on the photoresist layer, monitoring the development process in a manner to determine when the photoresist layer is first developed completely therethrough,
- applying fresh developer solution onto the photoresist layer in a direct response to said determination,
- thereafter allowing at least some of the applied fresh developer solution to remain on the photoresist layer, and
- terminating action of the developer solution on the photoresist layer at a controlled time after application of the fresh developer solution, whereby the photoresist development is completed after said controlled time.
3 more elements
Dependencies are inferred from the claim text.