US 5,176,782 AGranted

Apparatus for photochemically ashing a photoresist

AssigneeORC Manufacturing Co., Ltd.

InventorsNorio Ishibashi, Izumi Serizawa

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Abstract

An apparatus for photochemically decomposing a photoresist is disclosed wherein processing time can be minimized by inducing a uniform photochemical oxidative decomposing reaction over the whole surface of a base board, and an ozone gas atmosphere can be utilized efficiently. The apparatus includes a rotatable circular table supporting one or more base boards and an ashing platform arranged around the periphery of the table including an ozone feeding slit and an ozone discharge slit. The apparatus also includes a plurality of ultraviolet ray lamps arranged inside a box-shaped vessel located above the ashing platform. An upper cover plate is pivotally mounted on the ashing platform and includes a transparent window plate through which the ultraviolet rays pass to irradiate the base boards. An airtight flat space is formed between the ashing platform and the upper cover to contain the ozone atmosphere.

Claims2

Dependent claims

An apparatus for photochemically ashing a photoresist wherein said photoresist on an upper surface of a base board experiences photochemical oxidation decomposition as a result of ultraviolet ray irradiation in an ozone atmosphere, said apparatus comprising:

a circular table adapted for rotation in a horizontal plane and supporting said base board;
an ashing platform arranged around the periphery of said table and lying in said horizontal plane, said ashing platform including an ozone feeding slit and an ozone discharging slit, wherein said ozone feeding slit and said ozone discharging slit are arranged on opposite sides of said table which is interposed therebetween;
a plurality of ultraviolet ray lamps adapted to irradiate said base board and arranged inside a box-shaped vessel;
and
an upper cover plate pivotally mounted on said ashing platform and including a transparent window adapted to transmit said irradiation, said upper cover plate adapted to be displaced away from said ashing platform whereby said base board is accessed and displaced toward said ashing platform whereby an airtight flat space containing said base board is formed;
wherein said flat space is in fluid communication with said ozone feeding slit and said ozone discharging slit, and said flat space is adapted to contain said ozone atmosphere.

3 more elements

Dependencies are inferred from the claim text.