Method of forming a patterned glass layer over the surface of a substrate
AssigneeGeneral Electric Company
InventorsFranco N. Sechi, Paul F. Pelka, Katherine E. Pinkerton
Life of this patent
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AssigneeGeneral Electric Company
InventorsFranco N. Sechi, Paul F. Pelka, Katherine E. Pinkerton
Estimating the term…
Patterned glass layers which are defect-free and have smooth surfaces are formed by a method wherein a mixture of glass frit and a photoresist composition is applied to the surface of the substrate; the layer is photolithographically patterned by exposing and developing predetermined areas of the layer; then after development and prior to firing of the glass frit, the layer of material is subjected to treatment with a suitable plasma at a temperature below the thermal decomposition temperature of the photoresist composition to remove the photoresist composition from the portion of the resist layer remaining on the substrate; and then the remainder of the layer, consisting essentially of glass frit, is fired to form a smooth, defect-free, patterned glass layer over the surface of the substrate.
A method for forming a fused glass layer having a predetermined pattern defined therein over a substrate, said method comprising the steps of:
Dependencies are inferred from the claim text.