Method for polishing detector material
AssigneeHoneywell Inc.
InventorsAlbert J. Fusco, Bruce C. Cochran
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Abstract
A method for chemically-mechanically polishing detector material such as mercury cadmium telluride (HgCdTe) to obtain damage free surfaces. The polishing system includes a potassium-iodine iodide in a deionized water base, in combination with an inert lubricant, such as ethylene glycol, and a semisoft porous polishing pad made from, for example, an expanded polyurethane material.
Claims16
A method for the chemical-mechanical polishing of the surface of detector material to a high degree of planarity and surface quality, said method comprising the steps of:
- A. maintaining said material surface continuously wet with an excess quantity of an aqueous solution comprising potassium-iodine iodide in deionized water;
- and
- B. continuously wiping said material surface with a firm surface, using moderate pressure, while maintaining a relative movement between said material surface and said firm surface in order to remove material from the high points of said material surface.
A method for the chemical-mechanical polishing of mercury cadmium telluride (HgCdTe) surface to a high degree of planarity and surface quality, said method comprising the steps of:
- A. maintaining said HgCdTe surface continuously wet with an excess quantity of an aqueous solution comprising potassium-iodine iodide in deionized water, wherein said potassium-iodine iodide concentration in said deionized water is selected to provide optimum removal rate while maintaining surface quality;
- and
- B. continuously wiping said HgCdTe surface with a firm surface, using moderate pressure, while maintaining a relative movement between said HgCdTe surface and said firm surface in order to remove HgCdTe material from the high points of said HgCdTe surface.
A method as in claim 15 wherein said firm surface further comprises a semiporous, stiff, low-nap, low abrasive material.
Dependencies are inferred from the claim text.