Method for deposition of thin film alloys utilizing electron beam vaporization

The method of evaporation of alloys for thin film deposition on substrates comprising the steps of:

• bombarding an end of a wire of alloy, selected for deposition, in the vicinity of the substrate by high speed voltage attracted electrons;
• feeding the wire to replace the end being vaporized;
• and controlling the feeding of the wire in accordance with deposition rate detected in said vicinity.

The method of evaporation of alloys for thin film deposition on substrates comprising the steps of:

• bombarding an end of a wire of alloy, selected for deposition, in the vicinity of the substrate by high speed voltage attracted electrons;
• feeding the wire to replace the end being vaporized;
• and controlling the energy of the high speed electrons in accordance with deposition rate desired.

The method of evaporation of alloys for thin film deposition on substrates comprising the steps of:

• bombarding an end of a wire of alloy, selecting for deposition, in the vicinity of the substrate by high speed voltage attracted electrons;
• feeding the wire to replace the end being vaporized;
• and controlling the bombarding energy of the high speed electrons being in accordance with a characteristic of said end to determine the rate of deposition.