Photosensitive compositions
AssigneeFuji Photo Film Co., Ltd.
InventorsTeruo Nagano, Akira Nagashima
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AssigneeFuji Photo Film Co., Ltd.
InventorsTeruo Nagano, Akira Nagashima
Estimating the term…
A photosensitive composition containing at least one o-naphthoquinonediazide compound represented by the following general formula (I): ##STR1## wherein A represents a divalent aliphatic residue, a divalent substituted aliphatic residue, a divalent aromatic residue or a divalent substituted aromatic residue, and a discoloring agent which changes its color tone upon the interaction with a photodecomposition product of the o-naphthoquinonediazide compound. The photosensitive composition directly provides visible contrast between exposed portions and unexposed portions upon light exposure without development and is particularly useful for making lithographic printing plates, letterpress printing plates, IC circuits, photomasks, etc.
A photosensitive composition containing at least one o-naphthoquinonediazide compound represented by the following general formula (I) ##STR5## wherein A represents a divalent aliphatic residue, a divalent substituted aliphatic residue, a divalent aromatic residue or a divalent substituted aromatic residue, and a discoloring agent which changes its color tone upon the interaction with a photodecomposition product of the o-naphthoquinonediazide compound.
A photosensitive element, comprising:
Dependencies are inferred from the claim text.