US 4,399,016 AGranted

Plasma device comprising an intermediate electrode out of contact with a high frequency electrode to induce electrostatic attraction

AssigneeAnelva Corporation

InventorsTsutomu Tsukada, Hideo Takei

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Abstract

In a support member for supporting a sample processed in a hollow space between first and second electrodes between which a high frequency a.c. voltage is supplied to produce plasma in the hollow space, a conductor is laid on the first electrode with a first dielectric layer interposed therebetween and is covered with a second dielectric layer to be attached to the sample. A d.c. voltage source is connected through the first dielectric layer out of contact with the first electrode to induce electrostatic attraction during production of the plasma and, thereby, to fixedly attach the sample to the second dielectric layer. A temperature control member is embedded in the first electrode to control a temperature of the sample. The control member may be a cooling member or a heater. A plurality of the support members may be located on the first electrode. Preferably, the first and the second dielectric layers are of epoxy resin and polyimide resin, respectively.

Claims14

Dependent claims

In a plasma device for processing a sample by the use of plasma, comprising a chamber defining a hollow space therein, a first flat electrode member placed in said hollow space and having a first electrode surface, a second flat electrode member placed in said hollow space and having a second electrode surface directed towards said first electrode surface, support means having a first support surface to be brought into contact with said first electrode surface and a second support surface directed towards said second electrode surface for supporting said sample on said second support surface, a.c. voltage providing means for providing an a.c. voltage between said first and said second electrode members to produce said plasma between said first electrode member with said support means and said second electrode member, d.c. voltage producing means for producing a d.c. voltage to electrostatically couple said sample to said support means during production of said plasma and thereby to fixedly attach said sample to said second support surface, the improvement wherein:

said second means comprises:
a first dielectric layer defining said first support surface;
a conductor placed on said first dielectric layer out of contact with said first electrode surface and electrically connected to said d.c. voltage producing means, with said first electrode member electrically insulated fron said d.c. voltage producing means;
and
a second dielectric layer covered on said conductor and defining said second support surface to which said sample is to be attached.

2 more elements

Dependencies are inferred from the claim text.