Terpolymer resist compositions
AssigneeInternational Business Machines Corporation
InventorsYing Y. Cheng, Barbara D. Grant, Lester A. Pederson, Carlton G. Willson
Life of this patent
Estimating the term…
Abstract
A resist sensitive to electron beam (and X-ray) radiation but resistant to reactive ion etching is formulated from a novolac resin and a sensitizer which is a terpolymer of sulfur dioxide, an olefin is hydrocarbon and an unsaturated ether.
Claims11
A resist composition comprising a novolac resin and a sensitizer characterized in that said sensitizer is a terpolymer of sulfur dioxide, an olefin hydrocarbon and an unsaturated ether, said terpolymer containing olefin monomer and sulfur dioxide in a ratio of 1 to 1, with the olefin monomer comprising hydrocarbon and ether in a ratio between 4:1 and 1:4.
Dependencies are inferred from the claim text.