Photomask blank provided with a transparent electro-conductive layer
AssigneeKonishiroku Photo Industry Co., Ltd.
InventorsTakashi Hatano, Akira Maruyama, Keiko Hioka
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Abstract
There is presented a photomask blank provided with a transparent electroconductive layer, comprising a base having (a) a transparent electroconductive material coated thereon, and also having (b) a heavy metal oxide layer laminated on said material (a) in direct contact therewith or through an intermediary light-screening layer of the same heavy metal as in said layer (b).
Claims15
A photomask blank provided with a transparent electroconductive layer, comprising a base having (a) a transparent electroconductive material coated layer thereon, and also having (b) a heavy metal oxide layer laminated on said material (a) in direct contact therewith or through an intermediary light-screening layer of a heavy metal which is the same heavy metal as that comprised in said heavy metal oxide in said layer (b);
- each of said layers having a thickness of between 1 A and 1.mu..
Dependencies are inferred from the claim text.