Stripping compositions and methods of stripping resists
AssigneeJ. T. Baker Chemical Company
InventorsIrl E. Ward, Lisa G. Hallquist, Thomas J. Hurley
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Abstract
Stripping compositions for removing resist materials from substrates comprise compositions of a 2-pyrrolidinone compound and a tetrahydrothiophene 1,1-dioxide compound. Either or both of polyethylene glycol and a diethylene glycol monoalkyl ether may be added to provide even more effective stripping compositions.
Claims32
A stripping composition comprising from about 30 to about 90 weight percent of a 2-pyrrolidinone compound of the formula ##STR3## wherein R is selected from the group consisting of hydrogen, alkyl of 1 to 3 carbon atoms and hydroxyalkyl of 1 to 3 carbon atoms, and from about 10 to about 70 weight percent of a tetrahydrothiophene-1,1-dioxide compound of the formula ##STR4## wherein R.sup.1 is selected from the group consisting of hydrogen, methyl or ethyl.
Dependencies are inferred from the claim text.