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AssigneeBell Telephone Laboratories, Incorporated
InventorsAdam Heller, King L. Tai, Richard G. Vadimsky
Estimating the term…
Lithographic patterning of particular interest in fabrication of integrated circuitry is based on the photoinduced migration of silver into germanium selenide or other glassy material of appropriate absorption cross section for the chosen actinic radiation. Resists which are negative-acting yield high resolution attributed to initial introduction of the silver in chemically combined form chosen so as to result in formation of a silver compound with a glass component with the compound serving as silver source. Removal of excess silver-containing material is engineered on the basis of the form of silver introduction and results in conversion to a water soluble form. Commercial use will likely be based on an embodiment in which the now developed patterned resist serves as a dry etching mask during delineation of a relatively thick underlying layer of organic material. This procedure is particularly advantageous for use on partially processed circuitry in which prior operations have resulted in surface steps.
Process for fabrication of an article comprising an operation during which the article undergoing fabrication comprises an article surface and an overlying actinic processing layer, said processing layer consisting essentially of a chalcogenide glass and silver-containing material, the silver-containing material being largely concentrated to essentially uniform depth in the vicinity of a surface of the said layer, including the steps of (1) selectively exposing portions of the said processing layer to actinic radiation so as to induce migration of silver in a direction from the said surface into the body of said layer within such exposed portions thereby defining a pattern of material of reduced solubility in a developing agent;
Dependencies are inferred from the claim text.