Single neutralizer for dual ion beam system
AssigneeVeeco Instruments Inc.
InventorsMathew LEVOSO, John ADAMO, Binyamin RUBIN
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Abstract
The present disclosure provides an assisted ion beam deposition system with a single neutralization source or neutralizer used for both the deposition ion source and the assist ion source. In some embodiments, the assisted ion beam deposition system has only this one neutralizer. This one neutralizer provides the ignition and the beam neutralization for both ion sources. Having one neutralizer saves physical space in the system and lowers power usage.
Claims16
An ion beam deposition system comprising:
- a deposition system comprising a deposition beam source;
- an assist system comprising an assist beam source;
- and
- a neutralizer configured to provide low-energy electrons to the deposition system upon receipt of a request from the deposition system and to the assist system upon receipt of a request from the assist system.
An ion beam deposition system comprising:
- a first ion beam source;
- a second ion beam source;
- and
- a neutralizer configured to, upon receipt of a request, independently:
- provide low-energy electrons to the first ion beam source to enable production of a first ion beam;
- provide low-energy electrons the second ion beam source to enable production of a second ion beam;
- neutralize the first ion beam;
- and
- neutralize the second ion beam.
A neutralizer in an assisted ion beam deposition system, the neutralizer configured to, upon receipt of a request:
- enable igniting a plasma to produce an ion beam from a deposition beam source;
- enable igniting a second plasma to produce an assist beam from an assist beam source;
- neutralize the ion beam;
- and
- neutralize the assist beam.
Dependencies are inferred from the claim text.