System for supporting a pellicle in a lithographic apparatus, allowing for pressure increase in a region between the pellicle and a patterning device

Abstract

A pellicle support system for use in a lithographic apparatus, the system including: a pellicle; a pellicle support arranged to secure the pellicle relative to the surface of a patterning device so that an enclosed region is defined between the pellicle and the patterning device; and at least one conduit arranged to supply fluid to the enclosed region for increasing the pressure in the enclosed region.

Dependencies are inferred from the claim text.