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US 2026/0186429 A1Published application
In-situ cleaning for lithographic apparatus
AssigneeASML Netherlands B.V.
InventorsMax KOOLE, Andrey NIKIPELOV, Vladimir KVON
Life of this patent
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Abstract
A photoelectric plate (300) for use in place of a patterning device in a lithographic apparatus, the photoelectric plate comprising: a base layer (301); and a coating (302) provided on the base layer; wherein the coating is configured to convert impinging photons of EUV radiation into free electrons at a higher conversion efficiency than the base layer.
Claims17
-27. (canceled)
A photoelectric plate for use in place of a patterning device in a lithographic apparatus, the photoelectric plate comprising:
- a base layer having a conversion efficiency;
- and
- a coating disposed on the base layer;
- wherein the coating is configured to convert impinging photons of extreme ultraviolet (EUV) radiation into free electrons at a higher conversion efficiency than the conversion efficiency of the base layer.
1 more element
Dependencies are inferred from the claim text.