Substrate processing apparatus, substrate processing method, method of manufacturing semiconductor device, and recording medium

A substrate processing method, comprising:

• delivering, by a deliverer, at least one substrate to one of:
• a first position at which the at least one substrate is to be transferred;
• a second position at which the at least one substrate is to be transported;
• and
• a third position at which the at least one substrate is to standby;
• transporting the at least one substrate delivered to the second position to at least one process chamber in which the at least one substrate is to be processed;
• and
• processing the at least one substrate in the at least one process chamber,
• wherein the third position is located at a position that does not interfere with the first position and the second position.

A non-transitory computer-readable recording medium storing a program that is capable of causing, by a computer, a substrate processing apparatus to perform a process comprising:

• delivering, by a deliverer, at least one substrate to one of:
• a first position at which the at least one substrate is to be transferred;
• a second position at which the at least one substrate is to be transported;
• and
• a third position at which the at least one substrate is to standby;
• transporting the at least one substrate delivered to the second position to at least one process chamber in which the at least one substrate is to be processed;
• and
• processing the at least one substrate in the at least one process chamber,
• wherein the third position is located at a position that does not interfere with the first position and the second position.