Substrate processing apparatus and substrate processing method
AssigneeTokyo Electron Limited
InventorGentaro GOSHI
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AssigneeTokyo Electron Limited
InventorGentaro GOSHI
Estimating the term…
A substrate processing apparatus includes a container executing a drying process including a raising process for raising a pressure in the container, on a substrate housed therein; a pressure detecting unit detecting a pressure of process fluid in the container; a temperature detecting unit detecting a temperature of the process fluid in the container; and a controller including: a first unit calculating a density of the process fluid based on a first pressure and a first temperature detected in the raising process executed without drying liquid; a second unit that calculates a density of the process fluid based on a second pressure and a second temperature detected in the raising process executed with the drying liquid; a difference calculating unit calculating difference between the first and second densities; and a determining unit determining, based on the difference, appropriateness of a state of the liquid film.
A substrate processing apparatus comprising:
A substrate processing method to be executed by a substrate processing apparatus comprising:
Dependencies are inferred from the claim text.