Wafer holder for providing even temperature distribution

Abstract

This invention relates to a wafer holder for providing even temperature distribution, which comprises a support assembly and a diffusion unit. The diffusion unit is made of a porous material and is disposed on a top surface of the support assembly. The diffusion unit includes a main body, a plurality of protrusions, and at least one diffusion channel, wherein the protrusions and the diffusion channel are disposed on a bearing surface of the main body. A gas is transmitted to the diffusion unit from an inlet pipeline of the support assembly, and then transmitted through pores of the diffusion unit to the bearing surface, and comes into contact with the wafer on the diffusion unit to adjust the temperature of the wafer, and is beneficial for improving the uniformity of the temperature distribution of the wafer.

Dependencies are inferred from the claim text.