Ionized pulse air injection apparatus, dry cleaning system and dry cleaning method using the same
AssigneeTointech Inc.
InventorDong Seok OH
Life of this patent
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Abstract
An ion pulse air injection apparatus includes a pressure regulator configured to regulate a pressure value of air supplied from an external source to a set pressure value, a pulse generator configured to generate a pulse for supplying the air regulated to the set pressure value in a pulse form in a set frequency band, an ion generator configured to ionize the air supplied in the pulse form from the pulse generator, and an ion pulse air injector configured to inject the ionized air in the pulse form in the ion generator onto a surface of an object.
Claims18
An ion pulse air injection apparatus comprising:
- a pressure regulator configured to regulate a pressure value of an externally supplied air, and to generated a regulated air including a set pressure value;
- a pulse generator configured to generate a pulse for supplying the regulated air including the set pressure value in a pulse form in a set frequency band;
- an ion generator configured to ionize the air supplied in the pulse form from the pulse generator;
- and
- an ion pulse air injector configured to inject an ionized air in the pulse form from the ion generator onto a surface of a cleaning object.
A dry cleaning system comprising:
- a manufacturing execution system (MES) configured to manage a semiconductor manufacturing process;
- a fault detection and classification (FDC) server configured to transmit sensor data received from a semiconductor manufacturing equipment and information related to the analysis results of the sensor data to the MES;
- and
- an ion pulse air injection apparatus configured to regulate a pressure value of an externally supplied air to a set pressure value, to provide the regulated air including the set pressure value in a discontinuous pulse form in a set frequency band, to ionize the air provided in the discontinuous pulse form, and to spray the ionized air on a surface of a cleaning object, when the cleaning object is loaded into the semiconductor manufacturing equipment.
A dry cleaning method comprising:
- regulating a pressure value of an externally supplied air to a set pressure value, when a cleaning object is loaded into semiconductor manufacturing equipment;
- generating a pulse with a set frequency band to provide air regulated to the set pressure value in a pulse form;
- ionizing the air provided in the pulse form;
- and
- injecting the ionized air in the pulse form onto a surface of an object.
Dependencies are inferred from the claim text.