Dual channel showerhead

A semiconductor processing system, comprising:

• a remote plasma region;
• a processing chamber;
• and
• a showerhead at least partially defining the remote plasma region and at least partially defining the processing chamber, the showerhead comprising:
• a body having a top surface and a bottom surface, and wherein:
• the body defines a first gas channel formed, at least in part, by injection holes in fluid communication with a distribution cavity in which a plurality of radially-extending ribs of the body define a plurality of radially-extending passages, and wherein a first gas is flowable along the first gas channel so that the first gas injected through the injection holes and into the distribution cavity flows radially along the plurality of radially-extending passages and so that at least a portion of the first gas flowing along the plurality of radially-extending passages flows through distribution holes into the processing chamber,
• the body defines a second gas channel formed by a plurality of through holes that extend from the top surface to the bottom surface so that a second gas is flowable therethrough from the remote plasma region into the processing chamber, and
• the first and second gas channels are fluidly isolated from one another within the showerhead.

A showerhead for use in a semiconductor processing chamber, comprising:

• a body having a top surface and a bottom surface, and wherein:
• the body defines a first gas channel formed, at least in part, a plurality of chord-extending passages defined by a plurality of chord-extending ribs of the body, wherein a first gas is flowable along the first gas channel so that the first gas delivered to the chord-extending passages flows chordwise along the plurality of chord-extending passages and so that at least a portion of the first gas flowing along the chord-extending passages flows through distribution holes extending to the bottom surface,
• the body defines a second gas channel formed by a plurality of through holes that extend from the top surface to the bottom surface so that a second gas is flowable therethrough, and
• the first and second gas channels are fluidly isolated from one another within the showerhead.