Deposition mask and method of manufacturing the same

A method of manufacturing a deposition mask, the method comprising:

• forming an auxiliary coating film and a main coating film on a mask substrate and removing a portion of an upper main coating film to define a pixel opening;
• removing portions of a lower main coating film and a lower auxiliary coating film;
• removing a portion of the mask substrate to define a mask opening;
• and
• removing a portion of an upper auxiliary coating film so that the pixel opening and the mask opening are in communication with each other,
• wherein in the removing the portion of the mask substrate, the mask substrate is removed by a wet etching process.

An electronic device comprising:

• a display device formed using a deposition mask;
• the deposition mask comprising:
• a mask substrate surrounding a mask opening, the mask substrate including:
• a first surface;
• a second surface opposing the first surface;
• a side surface facing the mask opening and extending to the first surface and the second surface, and
• a first inclination angle defined by the first surface and the side surface of the mask substrate is 53° or more and 55° or less;
• a main coating film disposed on the mask substrate;
• and
• a mask pattern overlapping the mask opening and spaced apart from the main coating film with a pixel opening interposed therebetween,
• wherein the first surface faces the main coating film.