US 2026/0090324 A1Published application

Wafer transfer device detection system and wafer transfer device

AssigneeNanya Technology Corporation

InventorYi-Wen LIU

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Abstract

A wafer transfer device detection system includes detectors, a filling device, a wafer transfer device and a control center. Detectors are disposed between a plurality of process equipment in a process. Filling device performs a filling procedure. Wafer transfer device includes body and sensor disposed in body. Wafer transfer device transmits wafer of process. Sensor detects a gas concentration inside wafer transfer device during a transportation stage of the process. If gas concentration is higher than a preset gas concentration, sensor generates a wireless communication signal. Control center is coupled to detectors and filling device. If detectors receive the wireless communication signal. Detectors notify control center so that the control center transmits wafer transfer device to filling device from process. Control center controls the filling device to perform filling procedure so as to adjust gas concentration to a target gas concentration to retransmit wafer transfer device back to process.

Claims15

Dependent claims

A wafer transfer device detection system, comprising:

a plurality of detectors, disposed between a plurality of process equipment in a process;
a filling device, configured to perform a filling procedure;
a wafer transfer device, comprising a body and a sensor disposed in the body, wherein the wafer transfer device is configured to transmit a wafer of the process, wherein the sensor is configured to detect a gas concentration inside the wafer transfer device during a transportation stage of the process, wherein if the gas concentration is higher than a preset gas concentration, the sensor is configured to generate a wireless communication signal;
and
a control center, coupled to the detectors and the filling device, wherein if the detectors are configured to receive the wireless communication signal, the detectors are configured to notify the control center so that the control center is configured to transmit the wafer transfer device to the filling device from the process, wherein the control center is configured to control the filling device to perform the filling procedure so as to adjust the gas concentration to a target gas concentration to retransmit the wafer transfer device back to the process.

2 more elements

A wafer transfer device, configured to transmit a wafer of a process, wherein the wafer transfer device comprises:

a body, comprising:
a medial wall;
a bottom wall;
a first opening relative to the bottom wall;
a first accommodation space, jointly defined by the medial wall, the bottom wall and the first opening, wherein the first accommodation space is configured to accommodate the wafer and a wafer holder;
and
a second accommodation space, disposed in one of the medial wall and the medial wall, wherein the second accommodation space comprises a second opening;
and
a sensor, disposed in the second accommodation space, and configured to detect a gas concentration of the first accommodation space and the second accommodation space during a transportation stage of the process, wherein if the gas concentration is higher than a preset gas concentration, the sensor is configured to generate a wireless communication signal to notify a control center to transmit the wafer transfer device to a filling device so that the filling device is configured to perform a filling procedure so as to adjust the gas concentration to a target gas concentration.

6 more elements

Dependencies are inferred from the claim text.

Facts

Application: 18/892,557Filed 23 Sep 2024
Published: 26 Mar 2026
Term ends: Not estimatedThe source records don’t support an estimate.

Classification5 codes

H10P 72/0616
Apparatus for monitoring, sorting, marking, testing or measuring: monitoring of warpages, curvatures, damages, defects or the like
G01N 33/0004
Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00: gaseous mixtures, e.g. polluted air
H10P 72/1924
Closed carriers: characterised by atmosphere control
H10P
Generic processes or apparatus for the manufacture or treatment of devices covered

Family

No related US applications are recorded in the indexed filing history.

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