Substrate processing apparatus

An apparatus for processing a substrate, the apparatus comprising:

• a housing having a treatment space for processing a substrate inside;
• and
• a substrate supporter for supporting the substrate in the treatment space,
• wherein the substrate supporter is provided to support the substrate to be inclined downward from a center to an edge of the substrate when the substrate is placed on the substrate supporter.

An apparatus for processing a substrate, the apparatus comprising:

• a first body;
• a second body combined with the first body to provide a treatment space for processing the substrate therein, and disposed below the first body;
• a fluid supply unit for supplying a supercritical fluid to the treatment space;
• a lifting unit for raising and lowering the first body or the second body so that a relative position of the first body and the second body changes between an open position where the treatment space is open to the outside and a closed position where the treatment space is closed off from the outside;
• a substrate loader which is installed in the first body and in which a substrate loaded or unloaded by an external transfer robot at the open position is placed;
• and
• a substrate supporter installed on the second body and supporting the substrate at the closed position,
• wherein the substrate supporter includes:
• a support plate;
• a first support pin and a plurality of second support pins which are installed on the support plate to protrude upward from an upper surface of the support plate, and on which the substrate is placed, the plurality of second support pins having the same height, and
• an upper end of the first support pin is provided higher than upper ends of the plurality of second support pins, and
• the first support pin supports a center of the substrate,
• the plurality of second support pins is arranged to surround the first support pin, and
• a distance between each of the plurality of second support pins and the first support pin is the same, and intervals between the adjacent second support pins are provided to be same as each other.