Substrate processing apparatus and substrate processing method

Abstract

A substrate processing apparatus includes: a substrate holder configured to hold a substrate; a shower head including a first hollow portion, a first slit coupled to the first hollow portion and extending in a first direction, a second slit coupled to the first slit and extending in a second direction intersecting the first direction and a third direction intersecting the first and second directions, a third slit coupled to the second slit and extending in the first direction, and a plurality of first gas ejection holes coupled to the first hollow portion, the shower head facing the substrate holder; a pipe structure including a first pipe coupled to the third slit; and a gas supplier connected to the first pipe and configured to supply a gas to the substrate from the plurality of first gas ejection holes.

Dependencies are inferred from the claim text.