Substrate processing system

Abstract

A substrate processing system (10) includes a substrate processing apparatus (1) that supplies a processing fluid to substrates, a supplier (200) that guides a processing fluid to the substrate processing apparatus (1), and a heat collector (40) that collects heat from a drain liquid discharged from the substrate processing apparatus (1). The supplier (200) includes a heat controller (20) that controls the temperature of a processing fluid while circulating the processing fluid in the circulation passage (201), a supply passage (21) that guides a processing fluid from the heat controller (20) to the substrate processing apparatus (1), and a replenishment passage (22) that replenishes the heat controller (20) with a processing fluid. The heat collector (40) includes a heat pump (41) that collects heat from a drain liquid and gives heat to a processing fluid flowing in the replenishment passage (22).

Dependencies are inferred from the claim text.