Extreme ultraviolet (euv) radiation source apparatus

An extreme ultraviolet (EUV) radiation source apparatus, comprising:

• an EUV source vessel including a chamber;
• a crucible disposed in the chamber;
• a catcher disposed in the chamber, wherein the catcher has a first aperture and a second aperture separated from each other;
• a first channel adjacent to the first aperture, and configured to introduce a laser beam into the chamber;
• a second channel adjacent to the second aperture, and configured to allow EUV radiation to exit the chamber;
• and
• a first opening formed on the second channel and configured to dissipate heat or gas from the second channel.

An extreme ultraviolet (EUV) radiation source apparatus, comprising:

• an EUV source vessel including a chamber;
• a crucible disposed in the chamber;
• a catcher disposed in the chamber, wherein the catcher has a first aperture and a second aperture separated from each other;
• a first channel adjacent to the first aperture, and configured to introduce a laser beam into the chamber;
• a second channel adjacent to the second aperture, and configured to allow EUV radiation to exit the chamber;
• a first opening formed on the EUV source vessel;
• a second opening formed on the first channel;
• and
• a third opening formed on the second channel,
• wherein first opening, the second opening and the third opening are configured to dissipate heat or gas from the chamber.