Semiconductor photoresist composition and method of forming patterns using the composition

A semiconductor photoresist composition, comprising:

• an organometallic compound;
• a compound represented by Chemical Formula 1;
• and
• a solvent:
• wherein, in Chemical Formula 1,
• R1 is hydrogen, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C6 to C20 aryl group, a substituted or unsubstituted C7 to C20 arylalkyl group, or a combination thereof,
• X1 is a heteroatom having a valence of 2 to 5,
• L1 is a substituted or unsubstituted C1 to C10 alkylene group,
• m is an integer of 0 to 3,
• n is an integer of greater than or equal to 2, and
• m+n is an integer of 2 to 5.