Optical proximity correction method and mask manufacturing method including the opc method
AssigneeSamsung Electronics Co., Ltd.
InventorsSujin OH, Sanghun KIM, Jinseok OH
Life of this patent
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AssigneeSamsung Electronics Co., Ltd.
InventorsSujin OH, Sanghun KIM, Jinseok OH
Estimating the term…
Provided is an optical proximity correction (OPC) method. The OPC method includes inputting an OPC target design layout, dividing edges of an input OPC target design layout into a plurality of segments, setting a direction of progression of the segments, measuring angles of the segments with respect to the direction of progression, setting a mode for adding vertices according to angles measured in the measuring, adding vertices according to a set mode, adding at least one fake segment extending to an added vertex, and performing OPC based on an added fake segment.
An optical proximity correction (OPC) method comprising:
An optical proximity correction (OPC) method comprising:
A mask manufacturing method comprising:
Dependencies are inferred from the claim text.