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OwnerMatthew Voss, Brian J. Cardineau +2inventors
InventorsMatthew Voss, Brian J. Cardineau, Kai Jiang, Fabian Felix Eberle
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Organometallic precursor solutions containing one or more phosphonate, such as methylphosphonic acid, tert-butylphosphonic acid, diethoxyalyllphosphonate, benzylphosphonic acid, and phenylphosphonic acid, are described. Corresponding methods for forming radiation patternable coatings as well as methods for forming a pattern using a solventless developing process are also described. The incorporation of a phosphonate into an organometallic photoresist composition, such as an organotin photoresist composition, is described as a way to increase stability of organometallic precursor solutions, to improve the homogeneity of organometallic photoresist films, and/or to improve the patterning performance of organometallic photoresist coatings.
A precursor solution comprising a mixture of solvent, a radiation sensitive organometallic precursor composition with hydrolysable ligands, and a phosphonate, having a metal concentration from about 0.005 M to about 1.4 M, wherein the solution is essentially free of carboxylate functional groups, halogen groups, vinyl functional groups and phosphonate with C—OH groups.
Dependencies are inferred from the claim text.