Lithography scanner throughput

A method for optimizing scan speed of a lithography scanner device, the lithography scanner device including a reticle assembly stage and a wafer assembly stage, the method comprising:

• receiving a process design layout corresponding to a plurality of rows of fields to be formed on an associated wafer;
• determining a default machine constant of the lithography scanner;
• identifying a type of each of the plurality of rows of fields corresponding to the received process design layout, wherein the type of row of field is selected from a group including a center fields row, an edge fields row, or an edge and center field combined row;
• determining a scan speed in accordance with the determined type of row and the determined default machine constant;
• and
• processing the associated wafer utilizing the determined scan speed for each of the plurality of rows in accordance with the process design layout;
• wherein determining a center field row scan speed further comprises differentiating a scan time of the lithography scanner device and an acceleration time of the reticle stage assembly.

A system for optimizing scan speed of a lithographic scanner device, the system comprising:

• a reticle stage assembly, comprising a reticle and at least one motor for movement in the x-direction and the y-direction;
• a wafer stage assembly, comprising a wafer stage body and a wafer retention component configured to hold a wafer thereon;
• and
• a controller comprising a processor in communication with memory storing instructions which are executed by the processor to:
• receive a process design layout corresponding to a plurality of fields to be formed on the wafer,
• identify, via a field identification component, each of the plurality of fields as a center field or an edge field,
• determine, via a scan speed determination component, an optimum scan speed for each field in the plurality thereof in accordance with the identified field type, wherein determining an optimum scan speed for the center field comprises differentiating a scan time of the lithographic scanner device and an acceleration time of the reticle stage assembly, and
• activate, via a motor control component, the at least one motor in accordance with the determined optimum scan speed for each of the plurality of fields.