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US 2025/0155795 A1Published application
Photomask
AssigneeSamsung Display Co., Ltd.
InventorHYUNG-GYU PARK
Life of this patent
Estimating the term…
Abstract
A photomask includes: transparent substrate including a light-transmitting area and a light-blocking area adjacent to the light-transmitting area, and a light-blocking film disposed under the transparent substrate in the light-blocking area, wherein the transparent substrate has a recess that is at least partially in the light-transmitting area and adjacent to the light-blocking area.
Claims19
A photomask comprising:
- a transparent substrate including a light-transmitting area and a light-blocking area adjacent to the light-transmitting area;
- and
- a light-blocking film disposed under the transparent substrate in the light-blocking area,
- wherein the transparent substrate has a recess that is at least partially in the light-transmitting area and adjacent to the light-blocking area.
1 more element
A photomask comprising:
- a transparent substrate including a light-transmitting area and a light-blocking area adjacent to the light-transmitting area;
- and
- a light-blocking film disposed under the transparent substrate in the light-blocking area,
- wherein the transparent substrate has a recess continuously formed in the light-transmitting area and the light-blocking area.
1 more element
Dependencies are inferred from the claim text.