Substrate processing apparatus

Abstract

Provided is a substrate processing apparatus that performs respectively processes on a plurality of substrates in a plurality of sub chambers. The substrate processing apparatus includes a plurality of sub chambers in which processes are performed on a substrate, respectively, and a common exhaust part connected to the plurality of sub chambers to exhaust the inside of each of the plurality of sub chambers. Each of the plurality of sub chambers includes a substrate support on which the substrate is supported, a shower head provided to face the substrate support and configured to supply a process gas toward the substrate, an exhaust port provided below the substrate support and connected to the common exhaust part, and a flow control part including a cover plate provided along a circumference of the substrate support and configured to adjust an exhaust flow of the process gas to a lower portion of the substrate support.

Dependencies are inferred from the claim text.