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US 2025/0147423 A1Published application
Photolithographic rinse compositions and methods of forming patterns using the compositions
AssigneeSamsung Electronics Co., Ltd.
InventorsJINJOO KIM, DAIKI MINAMI, WON-JOON SON, HYUNJI SONG, SONGSE YI
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Abstract
Disclosed are photolithographic rinse compositions and methods of forming patterns using the same, the photolithographic rinse compositions including a gemini-type surfactant having a main chain including at least two hydrophobic groups and at least one hydrophilic group and at least two side chains branching from the main chain and including a hydrophilic group-including functional group, and a solvent.
Claims20
A photolithographic rinse composition, comprising
- a gemini-type surfactant having a main chain including at least two hydrophobic groups, at least one hydrophilic group, at least two side chains branching from the main chain, and a hydrophilic group-including functional group;
- and
- a solvent.
Dependencies are inferred from the claim text.