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US 2025/0147415 A1Published application
Resist composition and method of forming patterns using the same
AssigneeSamsung Electronics Co., Ltd.
InventorsSunyoung LEE, Haengdeog KOH, Yoonhyun KWAK, Jiyoun LEE, Kyuhyun IM, Jinwon JEON, Jungha CHAE, Minyoung HA
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