Method for examining a blank of a microlithographic photomask

Abstract

A method for examining a blank of a microlithographic photomask, including the steps of: a) arranging the blank on a first stage of a first examination apparatus such that a first and a second edge of the blank rest against stops of the first stage, b) ascertaining an examination location on the blank in a first coordinate system with the aid of the first examination apparatus, c) arranging the blank on a second stage of a second examination apparatus having an image recording unit, d) recording at least one image of the blank using the image recording unit such that the first and second edge are captured at least in part, and e) ascertaining a transformation rule on the basis of the first and second edge captured in the at least one image, in order to transform the examination location captured in the first coordinate system into a second coordinate system (142) of the second examination apparatus.

Dependencies are inferred from the claim text.