Photoresist compositions and methods of forming patterns using a photoresist composition

A photoresist composition, comprising

• an organometallic compound represented by Chemical Formula 1;
• and
• a solvent
• wherein, in Chemical Formula 1,
• M11 is a metal selected from Sn, Sb, In, Bi, Ag, Te, Au, Pb, Zn, Ti, Hf, Zr, Al, V, Cr, Co, Ni, Cu, Ga, Mn, Sr, W, Cd, Mo, Ta, Nb, Cs, Ba, La, Ce, or Fe,
• X11 and X12 are each independently selected from O, S, or NR′,
• A11 and B11 are each independently a linking group including a single bond, double bond, alkylene group, O, S, NR′, NHC(═O), SO, SO2, CO, O—CO—O, C(═O)O, OCO, or any combination thereof,
• Z11 is an aromatic ring substituted for A11, or Z11 is a linking group including a single bond, double bond, alkylene group, O, S, NR′, NHC(═O), SO, SO2, CO, O—CO—O, C(═O)O, OCO, or any combination thereof that together with A11 and B11 form an aromatic ring,
• R11 and R21 are each independently a substituent including a hydrogen, a hydroxy group, a halogen, alkyl group, an alkoxy group, a thiol group, an amine group, a cycloalkyl group, an alkenyl group, a cycloalkenyl group, an alkynyl group, a cycloalkynyl group, an aryl group, a heteroaryl group, or any combination thereof, or R11 is a solvent coordinated to M11, or R11 and R21 are each independently a linking group including a single bond, a double bond, an alkylene group, O, S, NR′, NHC(═O), SO, SO2, CO, O—CO—O, C(═O)O, OCO, or any combination thereof,
• R′ is each independently a substituent including a hydrogen, a hydroxy group, a halogen, alkyl group, an alkoxy group, a thiol group, an amine group, a cycloalkyl group, an alkenyl group, a cycloalkenyl group, an alkynyl group, a cycloalkynyl group, an aryl group, a heteroaryl group, or any combination thereof,
• n11 is a number of substitutable positions of M11, and
• n21 is a number of substitutable positions of the aromatic ring.