Apparatus and method for exposure of relief precursors
AssigneeXsys Prepress NV
InventorsDirk Ludo Julien DE RAUW, Pieter LENSSENS, Frederik DEFOUR
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AssigneeXsys Prepress NV
InventorsDirk Ludo Julien DE RAUW, Pieter LENSSENS, Frederik DEFOUR
Estimating the term…
An apparatus for exposure of a relief precursor includes a substrate layer and at least one photosensitive layer. The apparatus includes a first light source configured to illuminate a first side of the relief precursor, a movable second light source configured to illuminate a second side of the relief precursor opposite the first side, a movable shield located between the first light source and the second light source and configured to capture at least a portion of the light of the second light source transmitted through the relief precursor, and a moving means configured to move the movable shield simultaneously with the second light source.
An apparatus for exposure of a relief precursor which comprises a substrate layer and at least one photosensitive layer, said apparatus comprising:
A method for exposing a relief precursor, preferably using an apparatus according to any preceding claim, said method comprising:
An apparatus for exposure of a relief precursor which comprises a substrate layer and at least one photosensitive layer, said apparatus comprising:
Dependencies are inferred from the claim text.