Method for manufacturing pellicle and pellicle manufactured thereby

Abstract

A method for manufacturing the pellicle includes the steps of forming upper and lower silicon nitride layers on opposite surfaces of a wafer substrate, forming a metal layer on the lower silicon nitride layer, etching the upper silicon nitride layer to a preset thickness after the forming of the metal layer, etching and removing the metal layer after the etching of the upper silicon nitride layer, forming a graphene thin film on the upper silicon nitride layer, forming a pattern on the lower silicon nitride layer, etching the lower silicon nitride layer according to the formed pattern, and etching the wafer substrate along the lower silicon nitride layer etched according to the pattern.

Dependencies are inferred from the claim text.