Photomask handling assembly for atmospheric pressure plasma chamber
AssigneeApplied Materials, Inc.
InventorsNolan Layne ZIMMERMAN, Banqiu WU
Life of this patent
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AssigneeApplied Materials, Inc.
InventorsNolan Layne ZIMMERMAN, Banqiu WU
Estimating the term…
An automatic photomask handling assembly is employed for holding a photomask for cleaning processes in an atmospheric pressure plasma (APP) chamber. The automatic photomask handling assembly includes a set of stationary standoffs with each of the stationary standoffs having a first end solidly mounted to the photomask handling assembly and a second end that contacts an underside of a photomask. The automatic photomask handling assembly also has a handling stage that holds the photomask for processing. The handling stage has a set of through openings that allow the set of stationary standoffs to pass through the handling stage as the handling stage moves vertically. The handling stage also has a set of plates that automatically clamp and unclamp a photomask as the handling stage moves vertically. The set of plates completely surrounds the photomask such that the clamped photomask and the set of plates form a continuous surface.
-20. (canceled)
An chamber for cleaning a photomask, comprising:
A photomask handling assembly to support a photomask, comprising:
Dependencies are inferred from the claim text.