Photomask including monitoring mark

A photomask comprising:

• a base;
• a pattern layer disposed on the base;
• and
• a sub-monitoring mark comprising a plurality of test patterns defined as openings penetrating the base and the pattern layer,
• wherein the sub-monitoring mark comprises first through n-th test patterns,
• wherein each of the first through n-th test patterns comprises a first edge and a second edge extending along a first direction and facing each other along a second direction different from the first direction,
• wherein the first edge of an i-th test pattern among the first through n-th test patterns is spaced apart from the first edge of an (i−1)-th test pattern along the second direction by a unit width, and the unit width is constant along the second direction,
• wherein the second edge of each of the first through n-th test patterns is spaced apart from the first edge of a same test pattern by (kn+i) times the unit width along the second direction, and
• wherein n is a natural number, i is a natural number from 2 to n, and k is a natural number.

A photomask comprising:

• a base;
• a pattern layer disposed on the base;
• and
• a sub-monitoring mark comprising a plurality of test patterns, each including a plurality of openings penetrating the base and the pattern layer,
• wherein the sub-monitoring mark comprises first through n-th test patterns,
• wherein each of the first through n-th test patterns comprises the plurality of openings and a plurality of masking areas, which are extending along a first direction and alternately arranged along a second direction different from the first direction, and comprises a first outermost boundary and a second outermost boundary located at opposite outermost positions in the second direction and facing each other among a plurality of boundaries formed between the openings and the masking areas,
• wherein the first outermost boundaries of the first through n-th test patterns are aligned with each other along the first direction,
• wherein the second outermost boundary of a j-th test pattern among the first through n-th test patterns is spaced apart from the first outermost boundary of the j-th test pattern along the second direction by (kn+j) times a unit width, and the unit width is constant along the second direction, and
• wherein n is a natural number, j is a natural number from 1 to n, and k is a natural number.