Overlay measurement device and method, and system and program therefor

An overlay measurement system, comprising:

• a user terminal generating data that comprise information on a recipe which is input through a manager program, and unique information on an overlay measurement device, and transmitting the generated data to an overlay measurement device corresponding to the unique information, and
• the overlay measurement device analyzing a recipe included in the data that are received from the user terminal, and performing optimization of measurement options of a wafer, based on the recipe, after the recipe is analyzed,
• wherein the overlay measurement device measures an error between a first overlay mark and a second overlay mark respectively formed on different layers of a wafer,
• wherein the overlay measurement device comprises a light source, an aperture that changes a beam from the light source to be suitable for photographing the first overlay mark or the second overlay mark, and a detector for obtaining an image of the first overlay mark or an image of the second overlay mark,
• wherein the overlay measurement device is configured to:
• calculate statistical values of a plurality of parameters in relation each aperture by measuring one or more apertures once,
• apply a weight respectively to the calculated statistical values, and
• perform an aperture optimization process of selecting an aperture where a total of the statistical values to which the weight is applied respectively is a minimum value.

A method of an overlay measurement device for measuring an error between a first overlay mark and a second overlay mark respectively formed on different layers of a wafer, the method comprising:

• receiving data from a user terminal, the data comprising information indicating whether to execute the optimization of measurement options of a wafer;
• analyzing a recipe that is included in the data;
• and
• when analyzing the recipe is completed and the data includes information indicating an execution of the optimization, performing optimization of measurement options of a wafer, based on the recipe,
• wherein the overlay measurement device comprises a light source, an aperture that changes a beam from the light source to be suitable for photographing the first overlay mark or the second overlay mark, and a detector for obtaining an image of the first overlay mark or an image of the second overlay mark, and
• wherein the optimization comprises:
• calculating statistical values of a plurality of parameters in relation each aperture by measuring one or more apertures once,
• applying a weight respectively to the calculated statistical values, and
• performing an aperture optimization process of selecting an aperture where a total of the statistical values to which the weight is applied respectively is a minimum value.