Process detecting unit, substrate processing apparatus and substrate process monitoring method
AssigneeTes Co., Ltd
InventorsJong-Seok LEE, Seung-Min OH, In-Il JUNG
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Abstract
Provided is a substrate processing apparatus, more particularly, a substrate processing apparatus for detecting a progress and end point of a process for a substrate when a process such as a drying process is performed for a substrate using a supercritical fluid.
Claims15
A substrate processing apparatus comprising:
- a chamber providing a processing space in which a process is performed on a substrate coated with a processing liquid or an organic solvent using a fluid in a supercritical state;
- and
- a process detecting unit configured to calculate at least one parameter of the fluid discharged from the chamber and detect at least one of a progress of a process and an end point of the process for the substrate.
A substrate process monitoring method for detecting at least one of a progress and end point of the process for a substrate coated with a processing liquid or an organic solvent in a chamber using a fluid in a supercritical state, the method comprising:
- calculating at least one parameter of the fluid discharged from the chamber;
- and
- determining at least one of the progress of the process and the end point of the process for the substrate using the calculated parameter,
- wherein the calculating of the parameter includes calculating a dielectric constant of the fluid discharged from the chamber.
A process detecting unit for detecting at least one of a progress and end point of a process for a substrate coated with a processing liquid or an organic solvent in a chamber using a supercritical state, the process detecting unit comprising:
- an external electrode providing a flow channel in which the fluid flows and an internal electrode provided inside the flow channel;
- and
- calculator calculating a dielectric constant of the fluid discharged from the chamber and determines at least one of a progress of a process and an end point of the process for the substrate based on a calculated parameter of the dielectric constant of the fluid,
- wherein the process detecting unit is provided in a section in which the fluid in a fluid discharge line is maintained in a supercritical state.
Dependencies are inferred from the claim text.