Substrate processing apparatus

A substrate processing apparatus comprising:

• a rotating table configured to rotate a substrate;
• and
• a plurality of fixing members configured to fix the substrate on the rotating table by grasping the substrate while abutting an outer periphery of the substrate,
• wherein each of the plurality of fixing members includes a top portion, a base portion configured to hold the top portion, and a support portion configured to support the substrate,
• wherein the top portion includes:
• a curved surface on a side that abuts the substrate when viewed in a direction of a rotational axis of the rotating table;
• a reduced portion formed to be connected to an end of the curved surface when viewed in the direction of the rotational axis of the rotating table, and having a width in a direction perpendicular to a first direction facing away from the side that abuts the substrate, which is continuously reduced in the first direction from a boundary with the curved surface, and
• a first sloping surface which slopes downwards in the first direction when viewed in a direction that is perpendicular to the direction of the rotational axis of the rotating table and perpendicular to the first direction, and
• wherein the support portion is configured to support the substrate such that a top surface of the top portion is flush with an upper surface of the substrate in a state where the substrate is grasped.