A fluid handling system, method and lithographic apparatus

A fluid handling system for a lithographic apparatus, wherein the fluid handling system is configured to confine immersion liquid to a liquid confinement space between a part of a projection system and a surface of a substrate in the lithographic apparatus wherein a radiation beam projected from the projection system can irradiate the surface of the substrate by passing through the immersion liquid, the fluid handling system comprising:

• a first extraction member configured to extract fluid;
• a second extraction member configured to extract fluid;
• a damper arranged between the first and second extraction members and configured to support a meniscus of the immersion liquid between a surface of the damper and the surface of the substrate,
• wherein the damper, first extraction member and second extraction member are configured to limit movement of the meniscus to between the first and second extraction members during motions between the substrate and the damper while irradiating the surface of the substrate.