Apparatus and method of laser interference lithography

An apparatus of laser interference lithography, comprising:

• a dual-beam or multi-beam laser interference lithography device configured to perform an interference exposure on a wafer coated with a photoresist;
• a floodlight source having a patternable light field distribution and configured to perform a patterned flood exposure on the interference-exposed wafer;
• and
• a controller configured to:
• determine a first light field distribution in the interference-exposed wafer;
• determine a light field distribution of the floodlight source as a second light field distribution based on the first light field distribution, an expected pattern distribution, and parameters of the floodlight source;
• and
• pattern the light field distribution of the floodlight source based on the second light field distribution, and control the floodlight source having the patterned light field distribution to perform the patterned flood exposure on the interference-exposed wafer, so as to form the expected pattern distribution in the flood-exposed wafer.