Apparatus for treating substrate

A substrate treating apparatus comprising:

• a treating container having an inner space;
• a support unit configured to support and rotate a substrate within the inner space;
• an exhaust duct configured to exhaust an airflow within the inner space;
• and
• a plurality of guide members disposed in the treating container and configured to guide the airflow within the inner space,
• wherein the guide members are disposed adjacent so as to be inclined with respect to a tangential direction of the substrate supported by the support unit,
• wherein a guide member of the guide members is provided with a lengthwise direction of the guide member in a direction from a top to a bottom,
• wherein the treating container comprises:
• an outer cup having an inner space with an open top;
• and
• an inner cup disposed within the inner space, having a cup shape with an opening formed at a top, and having a treating space formed within, and
• wherein, in a stacking direction of the substrate on the support unit, a bottom surface of the guide member is inclined such that the airflow passes below the bottom surface of the guide member, a direction of the airflow being different at an edge of the bottom surface of the guide member than at another edge of the bottom surface of the guide member.