Pellicle
AssigneeShin-Etsu Chemical Co., Ltd.
InventorYu YANASE
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Abstract
A pellicle characterized by having an amount of released aqueous gas of 1×10−3 Pa·L/s or less per pellicle, an amount of released hydrocarbon-based gas of 1×10−5 Pa·L/s or less per pellicle in a range of measured mass number of 45 to 100 amu, and an amount of released hydrocarbon-based gas of 4×10−7 Pa·L/s or less per pellicle in a range of measured mass number of 101 to 200 amu, under vacuum after the pellicle has been left to stand for 10 minutes in an atmosphere of 23° C. and 1×10−3 Pa or less.
Claims16
A pellicle, comprising a pellicle film and a pellicle frame as essential elements, wherein a pressure adjustment part having a property applicable to extreme ultra violet (EUV) lithography is arranged, and the pressure adjustment part includes a ventilation part arranged between the pellicle frame and the pellicle film, or a ventilation part arranged between an exposure original plate (when the pellicle is attached to the exposure original plate) and the pellicle frame.
Dependencies are inferred from the claim text.