Substrate holder, substrate processing apparatus, method of manufacturing semiconductor device and recording medium

A substrate processing apparatus comprising:

• a substrate holder including:
• a substrate support including a plurality of first props capable of supporting a plurality of substrates at intervals in an up-down direction;
• and a partition support including a plurality of partitions and a plurality of second props, the plurality of partitions each having a cut-away portion at which the plurality of first props is disposed, the plurality of partitions being disposed one-to-one in spaces between the plurality of substrates held by the substrate support, the plurality of second props supporting the plurality of partitions;
• a reaction tube configured to house the substrate holder;
• and
• a gas supplier configured to supply gas into the reaction tube.

A method of manufacturing a semiconductor device by use of a substrate processing apparatus including:

• a substrate holder including:
• a substrate support including a plurality of first props capable of supporting a plurality of substrates at intervals in an up-down direction;
• and a partition support including a plurality of partitions and a plurality of second props, the plurality of partitions each having a cut-away portion at which the plurality of first props is disposed, the plurality of partitions being disposed one-to-one in spaces between the plurality of substrates held by the substrate support, the plurality of second props supporting the plurality of partitions;
• a reaction tube configured to house the substrate holder;
• and a gas supplier configured to supply gas into the reaction tube, the method comprising:
• loading the substrate holder into the reaction tube;
• and
• supplying the gas into the reaction tube.