Overlay measuring apparatus
AssigneeNanya Technology Corporation
InventorCHIEN-HSIEN LIU
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Abstract
The present application provides an overlay measuring apparatus, adapted to determine relative positions of two or more successive patterned layers of a device. The overlay measuring apparatus includes a stage and an imaging assembly. The device is placed on the stage. The imaging assembly includes a plurality of optical heads and a plurality of overlay marks assembled on the optical heads. The relative positions of the two or more successive patterned layers of the device are determined using light reflected from the device and passing through the overlay mark mounted on the respective optical head.
Claims22
An overlay measuring apparatus for determining relative positions of two or more successive patterned layers of a device, the overlay measuring apparatus comprising:
- a stage where the device placed;
- and
- an imaging assembly, comprising:
- a plurality of optical heads configured to record at least one image of the device;
- and
- a plurality of overlay marks assembled on the plurality of optical heads, respectively, wherein the relative positions of the successive patterned layers of the device are determined using light reflected from the device and passing through the respective overlay mark mounted on the optical head.
Dependencies are inferred from the claim text.