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US 2023/0251580 A1Published application
Method and device for the exposure of a photosensitive coating
AssigneeEV Group E. Thallner GmbH
InventorsBernhard Thallner, Boris Povazay, Tobias Zenger, Thomas Uhrmann
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Abstract
The invention relates to a method and a device for the exposure of a photosensitive coating.
Claims19
A method for exposure of a photosensitive coating, the photosensitive coating including at least a first photosensitive area and a second photosensitive area, comprising:
- reacting the first area to photons of a first wavelength;
- and the second area reacts to photons of a second wavelength, wherein the first wavelength is different from the second wavelength, wherein the method comprises the following steps, in particular in the following sequence:
- exposing the coating to photons of a first wavelength during which the first photosensitive area of the coating reacts to the photons of the first wavelength, and
- exposing the coating to photons of a second wavelength during which the second photosensitive area of the coating reacts to the photons of the second wavelength.
- wherein the first wavelength is different from the second wavelength.
2 more elements
A device for the exposure of a photosensitive coating, the photosensitive coating including at least a first photosensitive area and a second photosensitive area, the device comprising:
- a radiation device configured to:
- expose the coating to photons of a first wavelength during which the first photosensitive area of the coating reacts to the photons of the first wavelength;
- and
- expose the coating to photons of a second wavelength during which the second photosensitive area of the coating reacts to the photons of the second wavelength,
- wherein the first wavelength is different from the second wavelength.
2 more elements
Dependencies are inferred from the claim text.