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US 2021/0277512 A1Published application
Method of manufacturing mask, mask manufactured by the same, and method of manufacturing display apparatus by using the same
AssigneeSamsung Display Co., Ltd.
InventorsTaesung KIM, Yunjong YEO, Hyunmin CHO, Jihee SON, Sungsoon IM
Life of this patent
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Abstract
A method of manufacturing a mask, includes forming an organic material layer on a mask substrate and patterning a hard mask on the organic material layer, etching the organic material layer to form a mask sheet including through holes, removing the hard mask on the mask sheet, forming a conductive material layer on the mask sheet, and etching the conductive material layer to form a conductive layer.
Claims20
A method of manufacturing a mask, comprising:
- forming an organic material layer on a mask substrate and patterning a hard mask on the organic material layer;
- etching the organic material layer to form a mask sheet including through holes;
- removing the hard mask on the mask sheet;
- forming a conductive material layer on the mask sheet;
- and
- etching the conductive material layer to form a conductive layer.
3 more elements
A mask comprising:
- a frame;
- a mask sheet comprising through holes;
- and
- a conductive layer being spaced apart from the through holes on a plane, arranged between the frame and the mask sheet and fixed to the frame.
1 more element
Dependencies are inferred from the claim text.